The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2010
Filed:
Oct. 09, 2003
Tsunehisa Namiki, Yokohama, JP;
Toshihide Ieki, Yokohama, JP;
Hideo Kurashima, Yokohama, JP;
Hajime Inagaki, Yokohama, JP;
Akira Kobayashi, Yokohama, JP;
Koji Yamada, Yokohama, JP;
Tsunehisa Namiki, Yokohama, JP;
Toshihide Ieki, Yokohama, JP;
Hideo Kurashima, Yokohama, JP;
Hajime Inagaki, Yokohama, JP;
Akira Kobayashi, Yokohama, JP;
Koji Yamada, Yokohama, JP;
Toyo Seikan Kaisha, Ltd., Tokyo, JP;
Abstract
A method of forming a metal oxide film by the plasma CVD method and which includes reacting chiefly an organometal by a glow discharge in a low output region and, then, reacting the organometal with an oxidizing gas by the glow discharge in a high-output region to form a metal oxide film on the surface of a plastic substrate via an organic layer. This method forms a thin film having excellent adhesiveness, softness and flexibility on the surface of a plastic substrate relying on the plasma CVD method.