Company Filing History:
3 out of 6 
3 out of 3 
1 out of 1 Years Active: 2013-2022
Title: Toshiaki Yoshimura: Innovator in Plasma Treatment Technology
Introduction
Toshiaki Yoshimura is a notable inventor based in Iruma, Japan. He has made significant contributions to the field of plasma treatment technology, holding a total of 4 patents. His work focuses on improving the uniformity of film formation through innovative plasma treatment devices.
Latest Patents
Yoshimura's latest patents include a plasma treatment device and a structure of a reaction vessel for plasma treatment. The first invention enhances the in-plane uniformity of film formation via a plasma treatment. It features a plasma treatment device designed to exhaust process gas introduced between an electrode plate and a shower plate toward a counter electrode through multiple small holes in the shower plate. The device includes a diffuser plate with small holes arranged parallel to the shower plate, allowing the process gas to flow efficiently. The design ensures that the small holes in the downstream plate have smaller diameters, optimizing the flow and treatment process.
The second patent also aims to improve film uniformity during plasma treatment. This invention comprises an electrode plate and a counter electrode arranged in a reaction vessel, along with a transmission plate that supplies frequency power to the electrode plate. An insulator with a container shape stores the electrode plate, ensuring close contact with the inner surfaces of the insulator. This innovative design further enhances the efficiency of the plasma treatment process.
Career Highlights
Throughout his career, Toshiaki Yoshimura has worked with several companies, including Core Technology, Inc. and Askagi Corporation. His experience in these organizations has contributed to his expertise in plasma treatment technologies and innovations.
Collaborations
Yoshimura has collaborated with notable individuals in his field, including Hiroyuki Minowa and Lung Kei Amos Shek. These collaborations have likely enriched his work and led to advancements in plasma treatment technology.
Conclusion
Toshiaki Yoshimura is a distinguished inventor whose work in plasma treatment technology has led to significant advancements in the field. His innovative patents and collaborations reflect his commitment to improving film formation processes. His contributions continue to influence the industry and inspire future innovations.