The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Dec. 28, 2011
Applicants:
Ying-shih Hsiao, Taipei, TW;
Toshiaki Yoshimura, Iruma, JP;
Inventors:
Ying-Shih Hsiao, Taipei, TW;
Toshiaki Yoshimura, Iruma, JP;
Assignees:
Kern Energy Enterprise Co., Ltd., Taipei, TW;
Other;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01J 19/00 (2006.01); B01J 8/00 (2006.01); G05B 1/00 (2006.01); F23M 7/00 (2006.01); B05C 11/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The heat treating furnace for the gas reaction includes an outer body, an inner body, a heating mechanism, gas supplying mechanism, and a controller. Using the controller to control the amount of gas supply effectively keeps the first pressure (P) in the gas circulation chamber outside the inner body greater than the second pressure (P) in the reaction chamber inside the inner body all the time. In this way, the flow rate of gas inlet, reaction rate, cooling rate can be facilitated, and the uniformity of the thin film and the operational safety can be improved.