Toshiaki Tachi

Title: Toshiaki Tachi: Innovator in Photoresist Technology

Introduction

Toshiaki Tachi is a prominent inventor based in Kanagawa, Japan. He has made significant contributions to the field of photoresist technology, holding a total of 4 patents. His work focuses on methods and compositions that enhance the production of thick film photoresist patterns.

Latest Patents

One of Toshiaki Tachi's latest patents is a method for producing a thick film photoresist pattern. This method involves laminating a thick photoresist layer that includes a chemically amplified positive-type photoresist composition for thick film on a support. The process includes irradiating the thick photoresist layer and developing it to obtain a thick film resist pattern. The composition features an acid generator, a resin whose alkali solubility increases with acid action, and an organic solvent with specific properties. Another notable patent involves the production of a novolak resin through a two-step reaction process, which ultimately yields a positive photoresist composition when combined with a specific photosensitizer.

Career Highlights

Toshiaki Tachi is associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products for the semiconductor industry. His innovative work has positioned him as a key figure in the development of photoresist materials.

Collaborations

Toshiaki has collaborated with notable coworkers such as Mitsuo Hagihara and Kenji Maruyama. Their combined expertise has contributed to the advancement of photoresist technology.

Conclusion

Toshiaki Tachi's contributions to the field of photoresist technology are noteworthy. His innovative methods and compositions continue to influence the industry, showcasing his role as a leading inventor in this specialized area.