Kanagawa, Japan

Toshiaki Saishoji



Average Co-Inventor Count = 4.4

ph-index = 4

Forward Citations = 42(Granted Patents)


Location History:

  • Kanagawa, JP (1999 - 2005)
  • Hiratsuka, JP (1998 - 2006)
  • Nagasaki, JP (2010)

Company Filing History:


Years Active: 1998-2010

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10 patents (USPTO):Explore Patents

Title: Toshiaki Saishoji: Innovator in Silicon Crystal Technology

Introduction

Toshiaki Saishoji is a prominent inventor based in Kanagawa, Japan, known for his significant contributions to the field of silicon crystal technology. With a total of 10 patents to his name, he has made remarkable advancements in the methods and devices used for producing high-quality silicon crystals.

Latest Patents

One of Saishoji's latest patents is an "Apparatus for pulling single crystal by CZ method." This invention involves a Czochralski (CZ) single crystal puller that is equipped with a cooler and a thermal insulation member. These components are designed to be positioned within a CZ furnace, allowing for smooth recharge and additional charge of material. Furthermore, the apparatus facilitates the elimination of dislocations from a silicon seed crystal using the Dash's neck method. The design ensures that the cooler and thermal insulation member are moved upward away from the melt surface during critical processes, enhancing efficiency and effectiveness.

Another notable patent is the "Production method for silicon single crystal and production device for single crystal ingot, and heat treating method for silicon crystal wafer." This method outlines a process for growing silicon crystals using the Czochralsky method, with specific parameters for pulling speed and temperature gradients. The invention aims to produce high-quality silicon wafers by controlling oxygen concentration and optimizing heat treatment processes.

Career Highlights

Throughout his career, Toshiaki Saishoji has worked with notable companies such as Komatsu Electronic Metals Co., Ltd. and Komatsu Denshi Kinzoku Kabushiki Kaisha. His experience in these organizations has contributed to his expertise in silicon crystal technology and innovation.

Collaborations

Saishoji has collaborated with esteemed colleagues, including Kozo Nakamura and Toshirou Kotooka. These partnerships have further enriched his work and have led to advancements in the field.

Conclusion

Toshiaki Saishoji's contributions to silicon crystal technology through his patents and collaborations highlight his role as a leading inventor in this specialized field. His innovative approaches continue to influence the production of high-quality silicon crystals, making a significant impact on the industry.

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