Toshiaki Otaki

Title: Toshiaki Otaki - Innovator in Electron Beam Inspection Technology.

Introduction

Toshiaki Otaki is a notable inventor based in Yokohama-shi, Japan. He has made significant contributions to the field of electron beam inspection technology. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

1. **ELECTRON BEAM MASK INSPECTION APPARATUS** - This invention includes a first electrode plate with an opening, positioned between an objective lens and a mask substrate, allowing an electron beam to pass through. It features a mark above a stage, spaced from the mask substrate, with a figure pattern on its surface. A second electrode plate is arranged lower than the first, covering the gap between the mask substrate and the mark. The same potential is applied to the first electrode plate, the mark, and the second electrode plate as that applied to the mask substrate.

2. **ADJUSTMENT METHOD OF INSPECTION APPARATUS FOCUS POSITION, AND PATTERN INSPECTION APPARATUS** - This method involves measuring the height position of a pattern forming surface on an evaluation substrate with various figure patterns. It calculates an autofocus signal based on light amounts measured at front and back focus positions. The goal is to specify an inspection autofocus signal value that maintains a difference between autofocus signal values of different figure patterns within a threshold.

Conclusion

Toshiaki Otaki's work in electron beam inspection technology showcases his innovative spirit and dedication to advancing the field. His latest patent applications reflect his commitment to developing new methods and apparatuses that enhance inspection processes.