Tokyo, Japan

Toshiaki Hamano

USPTO Granted Patents = 4 

Average Co-Inventor Count = 1.4

ph-index = 1


Company Filing History:


Years Active: 2019-2024

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4 patents (USPTO):Explore Patents

Title: Toshiaki Hamano: Innovator in Ultrasonic Flaw Detection Technology

Introduction

Toshiaki Hamano is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of ultrasonic flaw detection technology, holding a total of four patents. His innovative work has advanced the capabilities of inspection devices, enhancing their effectiveness in various applications.

Latest Patents

Hamano's latest patents include an ultrasonic flaw detection device that features an ultrasonic probe capable of detecting waveform data from ultrasonic echoes emitted to an inspection area. This device incorporates a processing unit that continuously stores sampling data in a time series, allowing for detailed analysis. Another notable patent describes a similar ultrasonic flaw detection device that utilizes a sheet material with two-dimensional patterns attached to the inspection object. This design enables the imaging device to capture position information, linking detection results to specific locations on the inspection object.

Career Highlights

Toshiaki Hamano is currently employed at IHI Corporation, where he continues to develop innovative technologies in the field of ultrasonic inspection. His work has been instrumental in improving the accuracy and reliability of flaw detection methods, making significant impacts in various industries.

Collaborations

Hamano collaborates with talented coworkers, including Eisuke Shiina and Takuya Shimomura. Their combined expertise fosters a creative environment that drives innovation and enhances the development of advanced inspection technologies.

Conclusion

Toshiaki Hamano's contributions to ultrasonic flaw detection technology exemplify his dedication to innovation and excellence. His patents reflect a commitment to improving inspection methods, ensuring safety and quality across various applications.

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