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Toshiaki Fujimura

USPTO Granted Patents = 6

Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 21(Granted Patents)

Location History:

Shiga, JP (1985)
Otsu, JP (1980 - 1987)
Ohtsu, JP (1993 - 2001)

Company Filing History:

Toyo Boseki Kabushiki Kaisha

Years Active: 1980-2001

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6 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6333134 - Multilayered photopolymer element including sensitivity controlling agents (2001-12-25),

2. 5780202 - Antistatic photosensitive multilayered structure and method for (1998-07-14),

3. 5204223 - Photosensitive resin composition (1993-04-20),

4. 4699859 - Dot-etchable image-containing element useful in lithographic mask (1987-10-13),

5. 4544624 - Photosensitive resin composition (1985-10-01),

6. 4188221 - Photosensitive polyamide resin composition useful for making relief (1980-02-12),

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