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For the Inventor, By the Inventor

Otsu, Japan

Toshiaki Fujimura

This inventor holds 6 USPTO granted patents. Top assignee: Toyo Boseki Kabushiki Kaisha. Active years: 1980-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiaki Fujimura. Retrieved from https://idiyas.com/inventor/toshiaki-fujimura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6

% Patents Active = 100.0

Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 21(Granted Patents)


Location History:

  • Shiga, JP (1985)
  • Otsu, JP (1980 - 1987)
  • Ohtsu, JP (1993 - 2001)

Company Filing History:

goldMedal6 out of 789 
 
Toyo Boseki Kabushiki Kaisha
 patents

Years Active: 1980-2001

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6 patents (USPTO):Explore Patents
1. 6333134 - Multilayered photopolymer element including sensitivity controlling agents (2001-12-25),
2. 5780202 - Antistatic photosensitive multilayered structure and method for (1998-07-14),
3. 5204223 - Photosensitive resin composition (1993-04-20),
4. 4699859 - Dot-etchable image-containing element useful in lithographic mask (1987-10-13),
5. 4544624 - Photosensitive resin composition (1985-10-01),
6. 4188221 - Photosensitive polyamide resin composition useful for making relief (1980-02-12),

Title: Toshiaki Fujimura: Innovator in Photopolymer Technology

Introduction

Toshiaki Fujimura is a prominent inventor based in Ohtsu, Japan. He has made significant contributions to the field of photopolymer technology, holding a total of 6 patents. His innovative work focuses on enhancing the quality and functionality of photopolymer elements.

Latest Patents

Fujimura's latest patents include a multilayered photopolymer element that incorporates sensitivity controlling agents. This invention features a structure made up of at least a support, a photosensitive layer, and a cover film. The photosensitive layer consists of at least two layers, with the uppermost layer containing a sensitivity controlling agent bonded with a polymer. This design allows for the creation of a printing plate that delivers excellent print quality without excessive thickness due to impression. Another notable patent is the antistatic photosensitive multilayered structure, which includes a photosensitive layer and an antistatic cover film arranged on a substrate.

Career Highlights

Fujimura is associated with Toyo Boseki Kabushiki Kaisha, where he continues to develop innovative solutions in photopolymer technology. His work has been instrumental in advancing the capabilities of printing technologies.

Collaborations

Fujimura has collaborated with notable colleagues such as Masaru Nanpei and Kuniomi Etoh, contributing to various projects that enhance the field of photopolymer applications.

Conclusion

Toshiaki Fujimura's contributions to photopolymer technology exemplify his innovative spirit and dedication to advancing the industry. His patents reflect a commitment to improving print quality and functionality, making him a significant figure in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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