IDiyas

For the Inventor, By the Inventor

Ohtsu, Japan

Toshiaki Fujimura

USPTO Granted Patents = 6

Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 21(Granted Patents)


Location History:

  • Shiga, JP (1985)
  • Otsu, JP (1980 - 1987)
  • Ohtsu, JP (1993 - 2001)

Company Filing History:

goldMedal6 out of 789 
 
Toyo Boseki Kabushiki Kaisha
 patents

Years Active: 1980-2001

Loading Chart...
6 patents (USPTO):Explore Patents
1. 6333134 - Multilayered photopolymer element including sensitivity controlling agents (2001-12-25),
2. 5780202 - Antistatic photosensitive multilayered structure and method for (1998-07-14),
3. 5204223 - Photosensitive resin composition (1993-04-20),
4. 4699859 - Dot-etchable image-containing element useful in lithographic mask (1987-10-13),
5. 4544624 - Photosensitive resin composition (1985-10-01),
6. 4188221 - Photosensitive polyamide resin composition useful for making relief (1980-02-12),
This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…