This inventor holds 6 USPTO granted patents. Top assignee: Toyo Boseki Kabushiki Kaisha. Active years: 1980-2001.
Location History:
- Shiga, JP (1985)
- Otsu, JP (1980 - 1987)
- Ohtsu, JP (1993 - 2001)
Company Filing History:
Years Active: 1980-2001
Title: Toshiaki Fujimura: Innovator in Photopolymer Technology
Introduction
Toshiaki Fujimura is a prominent inventor based in Ohtsu, Japan. He has made significant contributions to the field of photopolymer technology, holding a total of 6 patents. His innovative work focuses on enhancing the quality and functionality of photopolymer elements.
Latest Patents
Fujimura's latest patents include a multilayered photopolymer element that incorporates sensitivity controlling agents. This invention features a structure made up of at least a support, a photosensitive layer, and a cover film. The photosensitive layer consists of at least two layers, with the uppermost layer containing a sensitivity controlling agent bonded with a polymer. This design allows for the creation of a printing plate that delivers excellent print quality without excessive thickness due to impression. Another notable patent is the antistatic photosensitive multilayered structure, which includes a photosensitive layer and an antistatic cover film arranged on a substrate.
Career Highlights
Fujimura is associated with Toyo Boseki Kabushiki Kaisha, where he continues to develop innovative solutions in photopolymer technology. His work has been instrumental in advancing the capabilities of printing technologies.
Collaborations
Fujimura has collaborated with notable colleagues such as Masaru Nanpei and Kuniomi Etoh, contributing to various projects that enhance the field of photopolymer applications.
Conclusion
Toshiaki Fujimura's contributions to photopolymer technology exemplify his innovative spirit and dedication to advancing the industry. His patents reflect a commitment to improving print quality and functionality, making him a significant figure in his field.