Kanagawa, Japan

Toshiaka Saishoji

This inventor holds 1 USPTO granted patent. Top assignee: Sumco Techxiv Corporation. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Toshiaka Saishoji. Retrieved from https://idiyas.com/inventor/toshiaka-saishoji

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Toshiaka Saishoji: Innovator in Silicon Single Crystal Manufacturing

Introduction

Toshiaka Saishoji is a prominent inventor based in Kanagawa, Japan. He is known for his significant contributions to the field of semiconductor manufacturing, particularly in the production of defect-free silicon single crystals. His innovative methods have the potential to enhance the quality and efficiency of silicon crystal production.

Latest Patents

Toshiaka Saishoji holds a patent for a "Method for manufacturing defect-free silicon single crystal." This patent describes a technique for controlling the temperature gradient on the side surface of a silicon single crystal, the height of the solid-liquid interface, and the oxygen concentration in the longitudinal direction of the silicon single crystal. The method aims to produce a defect-free silicon single crystal with a controlled oxygen concentration rapidly and stably. By utilizing a cylindrical cooler around the silicon single crystal and adjusting various parameters, such as the pulling speed and rotation speeds of both the crucible and the silicon single crystal, the desired conditions for optimal crystal growth can be achieved.

Career Highlights

Toshiaka Saishoji is associated with Sumco Techxiv Corporation, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the methods used in silicon crystal manufacturing, contributing to the overall progress in the semiconductor industry.

Collaborations

Throughout his career, Toshiaka has collaborated with notable colleagues, including Takashi Yokoyama and Toshirou Kotooka. These collaborations have fostered an environment of innovation and have led to further advancements in their respective fields.

Conclusion

Toshiaka Saishoji's contributions to the manufacturing of defect-free silicon single crystals represent a significant advancement in semiconductor technology. His innovative methods and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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