Toru Ihara

Title: Toru Ihara: Innovator in Substrate Processing Technology

Introduction

Toru Ihara is a notable inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, holding two patents that showcase his innovative approach to technology. His work focuses on enhancing the efficiency and effectiveness of substrate processing methods.

Latest Patents

Ihara's latest patents include a substrate processing apparatus and a substrate processing method. The substrate processing apparatus is designed to increase the pressure within a processing vessel to a level higher than the threshold pressure of a processing fluid. This is achieved by supplying the processing fluid into the vessel, which accommodates a substrate with a liquid on it. The method involves controlling the temperature of the substrate during the pressure increase, ensuring optimal conditions for processing. The apparatus also features a holding device with a conductive member, a conduction path structure, and a supply device for processing liquid, all aimed at improving the substrate processing experience.

Career Highlights

Throughout his career, Toru Ihara has worked with prominent companies, including Tokyo Electron Limited. His experience in these organizations has allowed him to refine his skills and contribute to advancements in substrate processing technology.

Collaborations

Ihara has collaborated with notable colleagues such as Gentaro Goshi and Masami Yamashita. Their combined expertise has likely fostered innovative solutions in their respective fields.

Conclusion

Toru Ihara's contributions to substrate processing technology through his patents and collaborations highlight his role as a significant inventor in this domain. His work continues to influence advancements in the industry.