Tong Wu

Title: Innovations of Tong Wu in Plasma Processing Technology

Introduction

Tong Wu is a prominent inventor based in Miyagi, Japan, known for his significant contributions to plasma processing technology. With a total of seven patents to his name, he has made remarkable advancements in the field, particularly in the design and functionality of plasma processing apparatuses.

Latest Patents

One of Tong Wu's latest patents is a plasma processing apparatus and plasma processing method. This innovative apparatus includes a plasma processing chamber, a base, and an electrostatic chuck. It features multiple electrode layers arranged in the same plane within the electrostatic chuck, along with a switch group that consists of several first switches connected to the electrode layers. The apparatus also includes a power supply and a measurement unit, which are electrically linked to the switch group. A second switch is designed to select either the power supply or the measurement unit as the connection destination for the switch group. The controller is capable of executing control operations, including switching the connection destination to the measurement unit and sequentially activating the first switches.

Another notable patent is a measuring device and an optical fiber strain measuring jig. This invention is designed to accurately measure the attraction force distribution on a wafer held by an electrostatic chuck. The measuring jig comprises a substrate that can be held by the electrostatic chuck and an optical fiber embedded with reflection elements. These elements reflect light corresponding to the strain of the substrate due to stress, and they are strategically positioned on one surface of the substrate.

Career Highlights

Tong Wu is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on enhancing plasma processing technologies, which are crucial for the production of advanced electronic devices.

Collaborations

Throughout his career, Tong Wu has collaborated with notable colleagues, including Tomohide Minami and Masaaki Miyagawa. These partnerships have contributed to the development of innovative solutions in the field of plasma processing.

Conclusion

Tong Wu's contributions to plasma processing technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing and related fields.