Company Filing History:
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1 out of 1,384 Years Active: 1998-2025
Title: Tomoyuki Matsumoto: Innovator in Photosensitive Resin Technology
Introduction
Tomoyuki Matsumoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photosensitive resin compositions, with a total of 6 patents to his name. His work has been instrumental in advancing technologies related to resist pattern films and plated formed products.
Latest Patents
Matsumoto's latest patents include innovative methods and compositions that enhance the production of resist pattern films and plated formed products. One of his notable inventions is a photosensitive resin composition that contains at least one compound selected from a specific group, which includes compounds represented by unique formulas. This composition is designed to improve the efficiency and effectiveness of resist pattern film production. Another significant patent focuses on a method for producing tin-silver plated formed products, utilizing a carefully formulated photosensitive resin composition that includes a polymer with an acid dissociative group, a photoacid generator, and specific solvents.
Career Highlights
Throughout his career, Matsumoto has worked with leading companies in the industry, including JSR Corporation and Mitsubishi Electric Corporation. His experience in these organizations has allowed him to refine his expertise in materials science and resin technology, contributing to his success as an inventor.
Collaborations
Matsumoto has collaborated with notable colleagues such as Naoki Nishiguchi and Fumio Kouzai. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field of photosensitive materials.
Conclusion
Tomoyuki Matsumoto's innovative work in photosensitive resin technology has made a lasting impact on the industry. His patents reflect a commitment to advancing the capabilities of resist pattern films and plated formed products. His contributions continue to influence the field and inspire future innovations.