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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12158700 B1

PDFFull Text
Date of Patent:
Dec. 03, 2024

Filed:

Jun. 14, 2019

Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated molded article, and semiconductor apparatus

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Hirokazu Sakakibara, Tokyo, JP;

Naoki Nishiguchi, Tokyo, JP;

Takuhiro Taniguchi, Tokyo, JP;

Tomoyuki Matsumoto, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

Chanceity N Robinson

Assistant Examiner:

Anna Malloy

Int. Cl.
CPC ...
G03F 7/038 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); C25D 3/12 (2006.01); C25D 3/38 (2006.01); C25D 5/02 (2006.01); C25D 7/12 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0382 (2013.01); C08F 220/18 (2013.01); C08F 220/283 (2020.02); C25D 3/12 (2013.01); C25D 3/38 (2013.01); C25D 5/022 (2013.01); C25D 7/12 (2013.01); G03F 7/0045 (2013.01); G03F 7/20 (2013.01); G03F 7/327 (2013.01); G03F 7/40 (2013.01);
Abstract

The present photosensitive resin composition includes a polymer (A) having a structural unit (a1) represented by a formula (a1), a structural unit (a2) represented by a formula (a2), and a structural unit (a3) represented by a formula (a3), and a photoacid generator (B). In the formulae (a1) to (a3), R, R, and Reach independently represent an organic group having 1 to 10 carbon atoms; Rrepresents a substituted or non-substituted alkyl group having 1 to 10 carbon atoms; Rrepresents a hydrogen atom, a substituted or non-substituted alkyl group having 1 to 10 carbon atoms, or a halogen atom; Rand Reach independently represent an acid dissociable group; Rrepresents a hydroxyaryl group; and l, m and n independently represent an integer from 0 to 10.

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