Yokohama, Japan

Tomowaki Takahashi

This inventor holds 36 USPTO granted patents and 2 EPO patents, primarily in Projection Optical Systems. Top assignees: Nikon Corporation, Nippon Kogaku K.k., Canon Kabushiki Kaisha. Active years: 1984-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomowaki Takahashi. Retrieved from https://idiyas.com/inventor/tomowaki-takahashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 77.8


Average Co-Inventor Count = 1.2

ph-index = 20

Forward Citations = 1,332(Granted Patents)


Location History:

  • Kawasaki, JP (1984)
  • Tokohama, JP (2000 - 2005)
  • Tokyo, JP (1986 - 2009)
  • Yokohama, JP (1997 - 2010)

Company Filing History:


Years Active: 1984-2010

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Areas of Expertise:
Projection Optical System
Exposure Apparatus
Catadioptric System
Dual-Imaging Optical System
Athermalized Zoom Lens
Telecentric Rear Converter
Zoom Lens
Catoptric Reduction
36 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Tomowaki Takahashi in Optical Systems

Introduction

Tomowaki Takahashi, an accomplished inventor based in Yokohama, Japan, has made significant strides in the field of optical systems. With a remarkable portfolio of 30 patents, his work has notably impacted the development of projection optical systems vital for various industrial applications.

Latest Patents

Among his latest innovations, Takahashi has developed a groundbreaking projection optical system and exposure apparatus. This cutting-edge system consists of eight reflectors and is designed to create a reduced image of a first surface onto a second surface. The projection optical system features a first reflective imaging optical system that produces an intermediate image of the first surface, coupled with a second reflective imaging optical system that transfers this intermediate image onto the second surface.

The first imaging system incorporates four sequentially arranged reflectors, while the second imaging system comprises another four reflectors. This design allows for effective aberration correction and maintains a favorable reflection characteristic for X-rays without enlarging the size of the reflectors. His innovative approach enables the realization of a reflective projection optical system that is not only efficient but also compact.

Career Highlights

Throughout his career, Takahashi has been associated with prestigious companies such as Nikon Corporation and Canon Kabushiki Kaisha. His experience in these prominent organizations has contributed to his expertise in designing advanced optical systems and has solidified his reputation as a leading inventor in this domain.

Collaborations

Tomowaki Takahashi has collaborated with notable colleagues, including Yutaka Suenaga and Hideki Komatsuda. These collaborations have played a crucial role in enhancing his research and development capabilities, fostering a dynamic environment of innovation and creativity.

Conclusion

Tomowaki Takahashi's contributions to the field of optical systems are invaluable. His extensive patent portfolio and collaboration with industry leaders highlight his commitment to advancing technology and improving optical systems. As he continues to innovate, his work will undoubtedly inspire future advancements in this crucial area of research and development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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