The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2004
Filed:
Oct. 06, 2000
Applicant:
Inventors:
Tomowaki Takahashi, Yokohama, JP;
Hiroyuki Tsukamoto, Kawasaki, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02D 1/300 ;
U.S. Cl.
CPC ...
G02D 1/300 ;
Abstract
A projection exposure apparatus has an illumination optical system for illuminating a mask formed with a pattern with beams of radiation, and a projection optical system for forming an image of the pattern on a workpiece on the basis of radiation from the mask. The illumination optical system supplies an illumination radiation having a center wavelength of 180 nm or smaller, and the projection optical system includes at least one concave mirror, fifteen or less pieces of refracting lenses, and four or more aspherical surfaces.