Tomoryo Shono

Title: Innovations by Tomoryo Shono in Semiconductor Technology

Introduction

Tomoryo Shono is a notable inventor based in Kawanishi, Japan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that focus on improving the efficiency and effectiveness of semiconductor devices.

Latest Patents

Shono's latest patents include advancements in semiconductor devices and manufacturing methods. His work involves a semiconductor device featuring copper (Cu) wiring that incorporates a basic crystal structure designed to minimize surface voids. This innovation allows for a reduction of surface voids to 1/10 or less of the current practical level. By specifying a barrier layer and a seed layer, he sets a proportion of occupation of a coincidence site lattice (CSL) boundary with a grain boundary Sigma value of 27 or less to all crystal grain boundaries of the Cu wiring to 60% or higher. Alternatively, a similar effect can be achieved by adjusting the proportion of CSL boundaries with a Sigma value of 3 to 40% or higher.

Career Highlights

Tomoryo Shono is currently employed at Renesas Electronics Corporation, where he continues to innovate in semiconductor technology. His work has been pivotal in enhancing the performance and reliability of semiconductor devices.

Collaborations

Shono collaborates with esteemed colleagues such as Takahiko Kato and Hiroshi Nakano, contributing to a dynamic research environment that fosters innovation.

Conclusion

Tomoryo Shono's contributions to semiconductor technology exemplify the impact of innovative thinking in the field. His patents not only advance the technology but also pave the way for future developments in semiconductor manufacturing.