Tomonori Miwa

Title: The Innovations of Tomonori Miwa: A Technological Pioneer from Miyagi

Introduction

Tomonori Miwa, an accomplished inventor based in Miyagi, Japan, has made significant contributions to the field of substrate processing. With a portfolio of five patents, Miwa's innovative techniques and methods have influenced the semiconductor industry, showcasing his expertise in etching technology.

Latest Patents

Among Miwa's latest patents are two notable inventions. The first is an "Etching Method and Substrate Processing Apparatus." This innovative method involves etching a substrate composed of an etching film and a mask, featuring a first and a second pattern with varying recess sizes. By strategically clogging the first opening of the first pattern while leaving the second opening of the second pattern clear, this method enhances precision in etching depth.

The second patent, simply termed "Etching Method," outlines a process for etching multilayered films that alternate between silicon oxide and silicon nitride, alongside single-layered silicon oxide films. This involves two distinct plasma processing stages, where specific temperatures are set on an electrostatic chuck to optimize the etching process.

Career Highlights

Tomonori Miwa's career has been closely tied to Tokyo Electron Limited, a leading company in semiconductor production equipment. His role at the company has allowed him to pioneer vital techniques that push the boundaries of substrate processing technology. Miwa’s inventions demonstrate a profound understanding of plasma technology and its application in etching processes.

Collaborations

Throughout his career, Miwa has worked alongside talented colleagues, including Masayuki Sawataishi and Akira Koshiishi. These collaborations have undoubtedly contributed to the innovative spirit within Tokyo Electron Limited, further enhancing the company's reputation in the semiconductor industry.

Conclusion

Tomonori Miwa stands out as a prominent figure in the field of semiconductor technology. His five patents reflect a commitment to advancing etching methods and improving substrate processing apparatuses, while his work with Tokyo Electron Limited emphasizes his valuable role in the industry. As technology continues to evolve, Miwa's innovative contributions will remain integral to the advancements in semiconductor manufacturing.