Nirasaki, Japan

Tomonori Horiuchi

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomonori Horiuchi. Retrieved from https://idiyas.com/inventor/tomonori-horiuchi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Tomonori Horiuchi: Innovator in Transfer Technology

Introduction

Tomonori Horiuchi is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of transfer technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of substrate transfer processes.

Latest Patents

Horiuchi holds a patent for a "Transfer apparatus and transfer method." This invention involves a transfer apparatus that transfers a first substrate and a second substrate while holding them in an overlapping position from a plan view. The apparatus includes a first holding arm designed to hold the first substrate horizontally and a second holding arm for the second substrate. It also features detection sensors to ascertain the presence or absence of each substrate, ensuring precise handling during the transfer process.

Career Highlights

Tomonori Horiuchi is associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His role at the company has allowed him to work on cutting-edge technologies that advance the capabilities of substrate transfer systems.

Collaborations

Horiuchi collaborates with various professionals in his field, including his coworker Dongwei Li. Their combined expertise contributes to the development of innovative solutions in transfer technology.

Conclusion

Tomonori Horiuchi's contributions to transfer technology through his patent demonstrate his commitment to innovation in the field. His work at Tokyo Electron Limited continues to influence advancements in substrate handling processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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