Company Filing History:
Years Active: 1989-2004
Title: Tomonobu Hata: Innovator in Semiconductor Technology
Introduction
Tomonobu Hata is a prominent inventor based in Kanazawa, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative work focuses on methods for creating crystalline insulation layers on silicon substrates, which are crucial for the development of advanced semiconductor devices.
Latest Patents
Hata's latest patents include a method for epitaxially growing a crystalline insulation layer on a crystalline silicon substrate while simultaneously growing silicon oxide, nitride, or oxynitride. In this method, a metal that forms a crystalline insulation layer is sputtered at a target and deposited as a film on a silicon substrate. The metal chemically combines with reactive gas around the silicon substrate to grow a crystal layer of a crystalline insulation substance. A voltage is applied to the substrate, attracting ions of the reactive gas to the surface of the silicon substrate, which chemically combines with silicon to form an insulation silicon compound layer. This results in a structure where a crystalline insulation layer is formed on a crystalline silicon layer through an amorphous insulation film, which has excellent insulation characteristics.
Another patent by Hata describes a method of forming a crystalline insulation layer on a silicon substrate. Similar to his previous work, this method involves sputtering a metal to create a crystalline insulation layer. The process allows for the epitaxial growth of additional semiconductor layers or crystalline ferroelectric layers on the surface of the crystalline insulation layer. This innovation enables the formation of three-dimensional semiconductor devices, composite semiconductor devices, and high-performance semiconductor memory devices, all at a reduced cost.
Career Highlights
Throughout his career, Tomonobu Hata has worked with notable companies such as Rohm Co., Ltd. and Bridgestone Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.
Collaborations
Hata has collaborated with esteemed colleagues, including Kimihiro Sasaki and Akira Kamisawa. These partnerships have further enhanced his research and development efforts in the semiconductor field.
Conclusion
Tomonobu Hata is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the industry. His innovative methods for creating crystalline insulation layers are paving the way for the next generation of semiconductor devices.