Tokyo, Japan

Tomoko Sekiguchi


 

Average Co-Inventor Count = 5.1

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2016-2017

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2 patents (USPTO):Explore Patents

Title: Tomoko Sekiguchi: Innovator in Electron Beam Measurement Technologies

Introduction

Tomoko Sekiguchi is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of electron beam measurement technologies. Her innovative work has led to the development of methods that enhance the precision of measurements in various applications.

Latest Patents

Tomoko Sekiguchi holds 2 patents that focus on advanced measurement techniques. Her latest patents include a "Method for estimating shape before shrink" and a "CD-SEM apparatus." The first patent addresses the challenge of accurately estimating the shape and dimensions of a resist before it shrinks when exposed to an electron beam. This method involves preparing a shrink database containing cross-sectional shape data and comparing it with CD-SEM images to output the estimated shape and dimensions. The second patent provides a measuring method that ensures high precision in determining pattern contours and dimensions, even when the object shrinks due to electron beam radiation. This method utilizes SEM images, material parameters, and beam conditions to calculate the pattern shape before irradiation.

Career Highlights

Throughout her career, Tomoko Sekiguchi has worked with notable companies, including Hitachi High-Technologies Corporation and Toshiba Corporation. Her experience in these organizations has allowed her to refine her skills and contribute to groundbreaking advancements in her field.

Collaborations

Tomoko has collaborated with esteemed colleagues such as Takeyoshi Ohashi and Junichi Tanaka. These partnerships have fostered an environment of innovation and have led to the successful development of her patented technologies.

Conclusion

Tomoko Sekiguchi is a trailblazer in the realm of electron beam measurement technologies. Her patents and career achievements reflect her dedication to advancing precision measurement methods. Her work continues to influence the field and inspire future innovations.

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