Tomoko Hamada

Title: Tomoko Hamada: Innovator in Cleaning Technologies

Introduction

Tomoko Hamada is a prominent inventor based in Kumamoto-ken, Japan. She has made significant contributions to the field of cleaning technologies, holding a total of 5 patents. Her innovative approaches have paved the way for advancements in cleaning methods and apparatuses.

Latest Patents

One of her latest patents is a method of cleaning a substrate by scrubbing. This invention provides a cleaning method where an object to be cleaned is held in a way that its surface faces a cleaning body. The object and the cleaning body are moved relative to each other while maintaining contact, allowing for effective cleaning. The contact pressure of the cleaning body is set to a maximum of 20 gf/cm² during the cleaning process. Another notable patent is a cleaning apparatus that includes a spin chuck for holding and rotating a wafer, a brush for rubbing the wafer's surface, and an arm for supporting the brush. This apparatus features a support coupled to the arm through a linear guide, allowing for horizontal movement and vertical displacement. A compression spring is integrated to generate a biasing force of the brush against the wafer, which can be adjusted by changing the downward movement of the support.

Career Highlights

Throughout her career, Tomoko has worked with notable companies such as Tokyo Electron Limited and Tokyo Electron Kyushu Limited. Her experience in these organizations has contributed to her expertise in cleaning technologies and innovation.

Collaborations

Tomoko has collaborated with esteemed colleagues, including Akira Yonemizu and Masatoshi Shiraishi. These partnerships have further enhanced her work and contributions to the field.

Conclusion

Tomoko Hamada is a remarkable inventor whose work in cleaning technologies has led to significant advancements. Her innovative patents and collaborations reflect her dedication to improving cleaning methods and apparatuses.