Tomokazu Sushihara

Title: Innovations of Tomokazu Sushihara

Introduction

Tomokazu Sushihara is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of plasma processing technology. With a total of 2 patents to his name, Sushihara's work has advanced the capabilities of plasma-processing apparatuses.

Latest Patents

One of his latest patents is a plasma-processing apparatus that features a high-frequency power application electrode. This apparatus generates plasma by supplying VHF power to the electrode. It includes impedance-matching equipment that consists of a capacitive element and an inductive element, which are connected in series. The design ensures that these elements are symmetrical with respect to the center of the high-frequency power application electrode.

Another significant patent is a method for forming a silicon nitride deposited film. In this method, a plate high-frequency electrode and a grounding electrode are positioned opposite each other within a vacuum vessel, maintaining an interval of less than 8 mm. Silane-based gas and nitrogen gas are introduced into the reaction space, allowing for the formation of a silicon nitride deposited film while keeping the pressure between 40 to 133. This process results in a high-quality silicon nitride film.

Career Highlights

Tomokazu Sushihara is currently employed at Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. His work at Canon has allowed him to focus on innovative solutions in plasma processing.

Collaborations

Sushihara has collaborated with notable coworkers, including Yukito Aota and Masahiro Kanai. Their combined expertise has contributed to the development of advanced technologies in their field.

Conclusion

Tomokazu Sushihara's contributions to plasma processing technology through his patents and work at Canon Kabushiki Kaisha highlight his role as an influential inventor. His innovative methods and apparatuses continue to impact the industry positively.