The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2009
Filed:
Dec. 29, 2003
Yukito Aota, Kanagawa, JP;
Masahiro Kanai, Tokyo, JP;
Atsushi Koike, Kanagawa, JP;
Tomokazu Sushihara, Chiba, JP;
Yukito Aota, Kanagawa, JP;
Masahiro Kanai, Tokyo, JP;
Atsushi Koike, Kanagawa, JP;
Tomokazu Sushihara, Chiba, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A plasma-processing apparatus having a high frequency power application electrode in which plasma is generated by supplying VHF power to the high frequency power application electrode. The plasma-processing apparatus has an impedance-matching equipment comprising a capacitive element and an inductive element, which are mutually connected in series. The apparatus is arranged so that the capacitive element and the inductive element of the impedance-matching equipment are symmetrical with respect to the center of the high frequency power application electrode.