Tomoka Suematsu

Title: Tomoka Suematsu: Innovator in Semiconductor Technology

Introduction

Tomoka Suematsu is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of semiconductor technology. Her innovative work focuses on enhancing the performance of semiconductor devices, particularly in the area of FinFET technology.

Latest Patents

Tomoka Suematsu holds a patent for a "Trenched gate double diffused semiconductor device with channel impurity concentration adjustment region." This invention addresses the challenges associated with FinFETs, specifically preventing the channel at the corner of the fin from becoming an ON state at low voltages. The design allows for a steep ON/OFF operation, which is crucial for efficient semiconductor performance.

Career Highlights

Suematsu is currently employed at Hitachi Power Semiconductor Device, Ltd. Her work at this esteemed company has allowed her to push the boundaries of semiconductor technology. With her expertise, she has contributed to advancements that are vital for modern electronic devices.

Collaborations

Throughout her career, Tomoka has collaborated with notable colleagues, including Takeru Suto and Naoki Watanabe. These partnerships have fostered an environment of innovation and creativity, leading to groundbreaking developments in the semiconductor industry.

Conclusion

Tomoka Suematsu is a trailblazer in semiconductor technology, with her patent showcasing her commitment to innovation. Her work continues to influence the field, paving the way for future advancements in electronic devices.