Tomohiro Nagata

Title: Tomohiro Nagata: Innovator in Aluminum Alloy Technology

Introduction

Tomohiro Nagata is a prominent inventor based in Chigasaki, Japan. He is known for his innovative contributions to the field of materials science, particularly in the development of aluminum alloy films. His work has significant implications for various applications, including electronics and manufacturing.

Latest Patents

Nagata holds a patent for an "Aluminum alloy film, method of producing the same, and thin film transistor." The objective of this invention is to provide an aluminum alloy film that exhibits excellent bending resistance and heat resistance. The aluminum alloy film includes an Al pure metal that contains at least one type of a first additive element selected from Zr, Sc, Mo, Y, Nb, and Ti. The content of this first additive element ranges from 0.01 atomic % to 1.0 atomic %. This innovative aluminum alloy film not only demonstrates superior bending and heat resistance but also allows for etching processes.

Career Highlights

Nagata is currently employed at Ulvac, Inc., a company recognized for its advancements in vacuum technology and materials. His role at Ulvac has allowed him to further explore and develop his innovative ideas in aluminum alloy technology.

Collaborations

Throughout his career, Nagata has collaborated with notable colleagues, including Yuusuke Ujihara and Motoshi Kobayashi. These collaborations have contributed to the advancement of research and development in their respective fields.

Conclusion

Tomohiro Nagata's contributions to aluminum alloy technology highlight his innovative spirit and dedication to advancing materials science. His patent for an aluminum alloy film showcases his ability to solve complex engineering challenges. His work continues to influence the industry and pave the way for future innovations.