Tomohiko Yamamoto

Title: The Innovative Contributions of Tomohiko Yamamoto

Introduction

Tomohiko Yamamoto is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His work focuses on advanced methods for pattern formation and device manufacturing, showcasing his expertise and innovative spirit.

Latest Patents

Yamamoto's latest patents include a pattern forming method and a method for manufacturing semiconductor devices. In his pattern forming method, double exposure is performed using a pair of photomasks, including an attenuated phase shift mask, to transfer patterns onto photoresist. This method employs double pole illumination as an illumination system to achieve finer patterns. Additionally, he has developed a method for measuring flare amount, which involves applying a photosensitive material to a substrate and exposing it using a mask with a transmitting section. This innovative approach allows for the measurement of flare based on the distribution of film amounts remaining after exposure.

Career Highlights

Throughout his career, Tomohiko Yamamoto has worked with notable companies, including Fujitsu Semiconductor Limited and Fujitsu Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Yamamoto has collaborated with various professionals in his field, including his coworker Satoru Asai. These collaborations have further enhanced his innovative capabilities and have led to the development of impactful technologies.

Conclusion

Tomohiko Yamamoto's contributions to semiconductor technology through his patents and career achievements highlight his role as a leading inventor in the industry. His innovative methods continue to influence the field and pave the way for future advancements.