The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2011
Filed:
Oct. 27, 2004
Tomohiko Yamamoto, Kawasaki, JP;
Tomohiko Yamamoto, Kawasaki, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
An exposure measurement apparatus is configured by including a size measurer measuring respective sizes of at least a pair of transferred patterns having mutually different optimal focus positions out of a plurality of transferred patterns formed by being transferred onto a transfer object, a difference value calculator obtaining a difference value between the size of one transferred pattern and the size of the other transferred pattern, a focus variation amount calculator calculating a focus variation amount of the transfer object using the difference value, and an exposure variation amount calculator calculating an exposure error amount of a wafer.