The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2009
Filed:
Mar. 06, 2008
Tomohiko Yamamoto, Kawasaki, JP;
Tomohiko Yamamoto, Kawasaki, JP;
Fujitsu Microelectronics Limited, Tokyo, JP;
Abstract
A reticle of the present invention has a main pattern () and a monitor pattern () each having a different thickness of a light-shielding film (), the light-shielding film () of the monitor pattern () being formed thicker than that of the main pattern (). Therefore, in a CD-focus curve, a focus center at which a focus value is the optimal value is shifted from the extremal value, so that a positive/negative direction of the focus is specified by monitoring the amount of shift using this shifted focus center. This configuration provides easy and highly accurate measurements of a focus error amount and the positive/negative direction of the focus. Ultimately, the measured focus error information is fed back to a next lot and is fed forward to a next process to manufacture a semiconductor device stably.