This inventor holds 3 USPTO granted patents. Top assignee: Kabushiki Kaisha Toshiba. Active years: 2000-2002.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000-2002
Title: Tomoharu Watanabe: Innovator in Chemical Mechanical Polishing
Introduction
Tomoharu Watanabe is a notable inventor based in Mie-ken, Japan. He has made significant contributions to the field of chemical mechanical polishing, with a focus on enhancing the efficiency and effectiveness of polishing apparatuses. With a total of 3 patents to his name, Watanabe's work is recognized for its innovative approach to solving complex problems in the polishing process.
Latest Patents
Watanabe's latest patents include an apparatus, backing plate, backing film, and method for chemical mechanical polishing. This polishing apparatus features a guide that is pressed against a polishing cloth during the polishing of an object. Within the guide, a ring is strategically arranged between a backing plate and a backing film. When the guide and polishing cloth rotate against each other, the force at the periphery of the object pressing the polishing cloth tends to drop. The ring is designed to prevent this force drop, thereby equalizing polishing rates across the surface of the object. Additionally, a polishing method is provided that is applicable to this innovative polishing apparatus.
Career Highlights
Tomoharu Watanabe is currently employed at Toshiba Corporation, where he continues to develop and refine his inventions. His work has significantly impacted the efficiency of polishing processes in various applications, showcasing his expertise in the field.
Collaborations
Watanabe has collaborated with notable colleagues, including Nobuhiro Kato and Satoshi Murakami. These collaborations have further enriched his work and contributed to advancements in the technology surrounding chemical mechanical polishing.
Conclusion
Tomoharu Watanabe stands out as a key innovator in the realm of chemical mechanical polishing. His patents and collaborative efforts reflect his commitment to advancing technology in this field. His contributions continue to influence the industry and pave the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile