The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2000
Filed:
Oct. 29, 1997
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
The present invention provides a CMP apparatus for minimizing the deterioration of the polishing performance and allows easy detection of the its useful operational limit. The CMP apparatus for polishing of the semiconductor substrate is provided with a dresser for removing abrasive grains which have fallen onto the polishing cloth. A particle remover is provided for easily removing abrasive grains at approximately the same time or at a different time as the dressing process. The polishing cloth includes a use limit indicator formed in a concavity of the cloth. Upon the exposure of the use limit indicator, the limit of the polishing cloth can be easily detected.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile