The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2001

Filed:

Sep. 09, 1999
Applicant:
Inventors:

Tomoharu Watanabe, Mie-ken, JP;

Nobuhiro Kato, Mie-ken, JP;

Assignee:

Kabushiki Kaisha Toshiba, Kawasaki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 1/00 ;
U.S. Cl.
CPC ...
B24B 1/00 ;
Abstract

A polishing apparatus has a guide (,) to be pressed against a polishing cloth (,) when polishing an object (,). Within the guide, a ring (,) is arranged between a backing plate (,) and a backing film (,). When the guide and polishing cloth are rotated to rub with each other, force of the periphery of the object of pressing the polishing cloth drops. The ring prevents such a force drop, thereby equalizing polishing rates over a surface of the object. Also provided is a polishing method applied to the polishing apparatus.


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Watanabe, Tomoharu. (2001). Apparatus, backing plate, backing film and method for chemical mechanical polishing (U.S. Patent No. 6276999). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6276999

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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