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For the Inventor, By the Inventor

Chiba, Japan

Tomoharu Matsushita

This inventor holds 8 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomoharu Matsushita. Retrieved from https://idiyas.com/inventor/tomoharu-matsushita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8

% Patents Active = 100.0

Average Co-Inventor Count = 4.8

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:

goldMedal8 out of 14,482 
 
Applied Materials, Inc.
 patents

Years Active: 2018-2026

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8 patents (USPTO):Explore Patents
1. 12735789 - Pocket heater with purge to improve gap tolerance (2026-09-15),
2. D1128616 - Substrate support for a substrate processing chamber (2026-06-02),
3. D1071886 - Substrate support for a substrate processing chamber (2025-04-21),
4. 12228395 - Substrate position calibration for substrate supports in substrate processing systems (2025-02-18),
5. 11201078 - Substrate position calibration for substrate supports in substrate processing systems (2021-12-14),
6. 11031273 - Physical vapor deposition (PVD) electrostatic chuck with improved thermal coupling for temperature sensitive processes (2021-06-08),
7. 10134615 - Substrate support with improved RF return (2018-11-20),
8. 9888528 - Substrate support with multiple heating zones (2018-02-06),

Title: Tomoharu Matsushita: Innovator in Substrate Processing Technologies

Introduction

Tomoharu Matsushita is a prominent inventor based in Chiba, Japan. He has made significant contributions to the field of substrate processing, holding a total of 8 patents. His work focuses on improving the efficiency and accuracy of substrate positioning in processing systems.

Latest Patents

Matsushita's latest patents include innovative technologies such as a substrate support for a substrate processing chamber and methods for substrate position calibration. These patents provide advanced solutions for substrate position calibration in substrate processing systems. In particular, one method involves obtaining a plurality of backside pressure values corresponding to different substrate positions, which helps in determining a calibrated substrate position.

Career Highlights

Tomoharu Matsushita is currently employed at Applied Materials, Inc., where he continues to develop cutting-edge technologies in substrate processing. His expertise has led to advancements that enhance the performance of processing systems, making them more reliable and efficient.

Collaborations

Matsushita has collaborated with notable colleagues, including Jallepally Ravi and Cheng-Hsiung Matt Tsai. These partnerships have fostered innovation and contributed to the success of various projects within the company.

Conclusion

Tomoharu Matsushita is a key figure in the field of substrate processing, with a strong portfolio of patents that reflect his innovative spirit. His contributions continue to shape the industry and improve processing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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