Tokyo, Japan

Tomoaki Yamazaki

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi-High-Technologies Corporation. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomoaki Yamazaki. Retrieved from https://idiyas.com/inventor/tomoaki-yamazaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Tomoaki Yamazaki: Innovator in Pattern Measurement Technology

Introduction

Tomoaki Yamazaki is a distinguished inventor based in Tokyo, Japan. He has made significant contributions to the field of pattern measurement technology. His innovative work focuses on enhancing the accuracy and stability of measurements in complex patterns.

Latest Patents

Yamazaki holds a patent for a pattern measurement device and a computer program. This invention is designed to accurately and stably perform measurements based on edge identification or pattern judgment, regardless of the fineness or deviation of the pattern. The device classifies pattern sites that are repeatedly arrayed at specific intervals and executes various identification and measurement processes based on the classified pattern sites.

Career Highlights

Tomoaki Yamazaki is currently associated with Hitachi High-Technologies Corporation, where he continues to develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of measurement devices in various applications.

Collaborations

Yamazaki collaborates with Hitoshi Namai, a fellow innovator, to further enhance their research and development efforts in the field of pattern measurement.

Conclusion

Tomoaki Yamazaki's contributions to pattern measurement technology exemplify his commitment to innovation and excellence. His work not only advances the field but also sets a benchmark for future developments in measurement devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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