The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 09, 2018

Filed:

Dec. 01, 2014
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventors:

Hitoshi Namai, Tokyo, JP;

Tomoaki Yamazaki, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); G01B 15/00 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); G01B 15/00 (2013.01); H01J 2237/24578 (2013.01); H01J 2237/2817 (2013.01);
Abstract

The present invention is: a pattern measurement device that, regardless of increased fineness, deviation, or the like of a pattern, accurately and stably performs measurement on the basis of edge identification or pattern or edge judgment; and a computer program. The pattern measurement device classifies pattern sites (G, G, G, G), which are repeatedly arrayed at a specific interval, in accordance with the position of the pattern sites, and executes a pattern edge type identification, a pattern type identification, or a measurement of the dimensions between predetermined pattern sites on the basis of an association between the classified pattern sites and information pertaining to the pattern edge type or information pertaining to the pattern type. The computer program causes a computer to execute the abovementioned process.


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