Toyama, Japan

Tomoaki Ishihara


Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2000-2002

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2 patents (USPTO):Explore Patents

Title: The Innovative Mind of Tomoaki Ishihara

Introduction

Tomoaki Ishihara, an accomplished inventor based in Toyama, Japan, has made significant contributions to the field of materials engineering through his innovative patents. With a total of two patents to his name, Ishihara continues to push the boundaries of technology, particularly in the relevant areas of thin film formation and transistor production.

Latest Patents

Ishihara's latest patents include a "Method for forming thin film" and a "Method of producing thin film transistor." The "Method for forming thin film" outlines a novel approach that involves a sequence of idling discharges at varying levels of discharge power while introducing sputtering gas. This method stabilizes the pressure of the sputtering gas and the intermediate products, enabling the consistent formation of thin films, such as indium tin oxide (ITO), on substrates.

His "Method of producing thin film transistor" details a systematic procedure that enhances the reliability of transistor structures. This involves creating multiple interlayer insulation films and contact holes, culminating in the formation of a transparent electro-conductive film that reinforces the bonding process for wires. This invention notably contributes to the robustness of electronic devices, ensuring enhanced performance and longevity.

Career Highlights

Tomoki Ishihara has had an impressive career, having worked with prominent organizations such as Matsushita Electric Industrial Co., Ltd. and Matsushita Electronics Corporation. His tenure in these leading companies has enabled him to refine his skills in electronic materials and product development, cementing his status as an expert in the industry.

Collaborations

Throughout his career, Ishihara has collaborated with esteemed colleagues, including Kazunori Kobayashi and Toshihide Nobusada. These partnerships have fostering an environment of innovation and creativity, allowing for the sharing of ideas and advancing technology in their respective fields.

Conclusion

Tomoaki Ishihara stands out in the realm of inventors for his innovative contributions to thin film technology and transistors. His patents reflect a deep understanding of material science and engineering principles, showcasing what can be achieved through dedication and collaboration. As we look toward the future, Ishihara's work will undoubtedly continue to influence advancements in electronics and beyond.

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