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For the Inventor, By the Inventor

Aichi, Japan

Tomoaki Ishibashi

This inventor holds 5 USPTO granted patents and 2 EPO patents. Top assignee: Fujimi Incorporated. Active years: 2002-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomoaki Ishibashi. Retrieved from https://idiyas.com/inventor/tomoaki-ishibashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5

% Patents Active = 60.0


Average Co-Inventor Count = 1.6

ph-index = 3

Forward Citations = 41(Granted Patents)


Location History:

  • Aichi, JP (2002 - 2004)
  • Kiyosu, JP (2022 - 2023)

Company Filing History:

goldMedal5 out of 285 
 
Fujimi Incorporated
 patents

Years Active: 2002-2023

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5 patents (USPTO):Explore Patents
1. 11781039 - Polishing composition and polishing method (2023-10-10),
2. 11261346 - Polishing composition (2022-03-01),
3. 6811583 - Polishing composition for a substrate for a magnetic disk and polishing method employing it (2004-11-02),
4. 6645051 - Polishing composition and polishing method for polishing a substrate to be used for a memory hard disk employing it (2003-11-11),
5. 6423125 - Polishing composition (2002-07-23),

Title: Tomoaki Ishibashi: Innovator in Polishing Compositions

Introduction

Tomoaki Ishibashi is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of polishing compositions, particularly in applications related to semiconductor substrates. With a total of 5 patents to his name, Ishibashi's work has been instrumental in advancing polishing technologies.

Latest Patents

Ishibashi's latest patents include innovative solutions for polishing compositions. One of his patents focuses on a polishing composition and method that prevents the settling of abrasives while maintaining optimal polishing performance. Another patent addresses the improvement of redispersibility of abrasives without compromising polishing efficiency. Additionally, he has developed polishing compositions specifically designed for materials with a Vickers hardness of 1500 Hv or higher, utilizing alumina abrasives and water.

Career Highlights

Ishibashi is currently employed at Fujimi Incorporated, where he continues to innovate in the field of polishing technologies. His work has garnered attention for its practical applications in semiconductor manufacturing, contributing to enhanced performance and efficiency in the industry.

Collaborations

Ishibashi has collaborated with notable colleagues such as Hiroyasu Sugiyama and Toshiyuki Takahashi. Their combined expertise has furthered the development of advanced polishing solutions.

Conclusion

Tomoaki Ishibashi's contributions to polishing compositions have made a significant impact in the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in this essential field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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