The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2023
Filed:
Dec. 22, 2017
Applicant:
Fujimi Incorporated, Kiyosu, JP;
Inventors:
Tomoaki Ishibashi, Kiyosu, JP;
Hiroki Kon, Kiyosu, JP;
Assignee:
FUJIMI INCORPORATED, Kiyosu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01G 1/02 (2006.01); B24B 37/04 (2012.01); C09G 1/02 (2006.01); C09K 3/14 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 37/044 (2013.01); C09K 3/1409 (2013.01); H01L 21/30625 (2013.01);
Abstract
Solutions are disclosed for preventing the settling of an abrasive, while maintaining the polishing performance of a polishing composition. Solutions are disclosed for improving the redispersibility of an abrasive while maintaining the polishing performance. Polishing compositions for use in polishing a semiconductor substrate according to the present disclosure include an abrasive, a layered compound, and a dispersion medium.