Tokyo, Japan

Tomoaki Furusho


Average Co-Inventor Count = 5.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014-2021

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3 patents (USPTO):Explore Patents

Title: Tomoaki Furusho: Innovator in Silicon Carbide Technology

Introduction

Tomoaki Furusho is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the development of silicon carbide substrates and devices. With a total of 3 patents to his name, Furusho's work is pivotal in advancing the efficiency and quality of semiconductor manufacturing.

Latest Patents

Furusho's latest patents include innovative methods and materials that enhance the performance of silicon carbide substrates. One of his notable inventions is a silicon carbide substrate designed to have a low defect density, which prevents contamination in process devices. This substrate features an inner portion and an outer portion, with specific impurity concentration levels that optimize its performance. Another significant patent involves a silicon carbide epitaxial wafer that addresses issues related to lattice mismatch, ensuring better crystal quality and voltage sustaining performance in semiconductor devices.

Career Highlights

Throughout his career, Tomoaki Furusho has worked with esteemed organizations such as Mitsubishi Electric Corporation and Nagoya University. His experience in these institutions has allowed him to collaborate on various projects that push the boundaries of semiconductor technology. His work has been instrumental in developing solutions that meet the growing demands of the electronics industry.

Collaborations

Furusho has collaborated with notable colleagues, including Kenichi Ohtsuka and Nobuyuki Tomita. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas in the field of semiconductor research.

Conclusion

Tomoaki Furusho's contributions to silicon carbide technology exemplify his dedication to innovation in the semiconductor industry. His patents and collaborations reflect a commitment to advancing technology that meets modern demands. His work continues to influence the future of semiconductor manufacturing.

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