Company Filing History:
Years Active: 2022-2025
Title: Tomoaki Fujimoto: Innovator in Substrate Cleaning Technologies
Introduction
Tomoaki Fujimoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of cleaning apparatuses, particularly in the semiconductor industry. With a total of 6 patents to his name, Fujimoto's innovations focus on enhancing the efficiency and effectiveness of substrate cleaning processes.
Latest Patents
Fujimoto's latest patents include a cleaning apparatus and a polishing apparatus designed for wafers. The cleaning apparatus features a cleaning tank that defines a cleaning space for the wafer, a wafer rotation mechanism, and a cleaning member that contacts and cleans the wafer's surface. This cleaning member is rotatable and has a length that exceeds the wafer's radius. Additionally, the apparatus includes a swing mechanism that allows the cleaning member to move from a retracted position to a cleaning position directly above the wafer. Another notable patent is the substrate cleaning apparatus, which incorporates a substrate rotating part, an edge cleaning member, and a control part that manages the cleaning process for the edge areas of the substrate.
Career Highlights
Fujimoto is currently employed at Ebara Corporation, a leading company in the field of fluid machinery and environmental engineering. His work at Ebara has allowed him to develop innovative cleaning technologies that are crucial for the semiconductor manufacturing process. His expertise in this area has positioned him as a key figure in advancing substrate cleaning methods.
Collaborations
Fujimoto collaborates with talented coworkers, including Mitsuru Miyazaki and Takuya Inoue. Their combined efforts contribute to the development of cutting-edge technologies in the cleaning apparatus sector.
Conclusion
Tomoaki Fujimoto's contributions to substrate cleaning technologies have made a significant impact in the semiconductor industry. His innovative patents and work at Ebara Corporation highlight his dedication to improving cleaning processes.