Toyama, Japan

Tomihiro Amano

USPTO Granted Patents = 9 

Average Co-Inventor Count = 2.5

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2015-2025

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9 patents (USPTO):Explore Patents

Title: Tomihiro Amano: Innovator in Semiconductor Processing Technologies

Introduction

Tomihiro Amano, an accomplished inventor based in Toyama, Japan, has made significant contributions to the field of semiconductor processing. With a total of eight patents to his name, Amano is recognized for his innovative designs that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Amano's latest patents focus on advanced substrate processing apparatuses and methods related to semiconductor devices. His work includes a substrate processing technique that features a substrate mounting table, a process container, and gas supply systems designed to improve processing environments. Notably, one of his patents addresses the limitations of conventional substrate processing apparatuses that struggle to generate high-density plasma. His design incorporates a tubular reaction vessel with a coil for enhanced gas introduction and a substrate processing chamber optimized for gas exhaust, ultimately increasing throughput in semiconductor processing.

Career Highlights

Throughout his career, Tomihiro Amano has worked with prominent firms in the electronic and semiconductor industries, including Kokusai Electric Corporation and Hitachi Kokusai Electric Inc. These experiences have provided him with invaluable insights and the opportunity to develop innovative solutions that address industry challenges.

Collaborations

Amano has collaborated with several esteemed colleagues, notably Hidehiro Yanai and Shin Hiyama. Their combined expertise has fostered a collaborative environment that promotes innovation and the continuous improvement of semiconductor processing technologies.

Conclusion

Tomihiro Amano's contributions to the field of semiconductor processing through his patents and collaborative efforts are a testament to his ingenuity and dedication as an inventor. His work not only enhances manufacturing processes but also sets the stage for future advancements in the semiconductor industry.

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