Ness-Ziona, Israel

Tomer Haim Peled

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials Israel Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tomer Haim Peled. Retrieved from https://idiyas.com/inventor/tomer-haim-peled

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.8

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: Tomer Haim Peled: Innovator in Semiconductor Measurement Technology

Introduction

Tomer Haim Peled is an inventor based in Ness-Ziona, Israel. He has made significant contributions to the field of semiconductor measurement technology. His innovative approach focuses on enhancing the accuracy and efficiency of metrology applications.

Latest Patent Applications

Tomer Haim Peled has filed a patent application titled "END-TO-END MEASUREMENT FOR SEMICONDUCTOR SPECIMENS." This application describes a system and method for examining a semiconductor specimen. The method involves obtaining a runtime image of the specimen and using it as input for an end-to-end (E2E) learning model. The model processes the image to produce runtime measurement data specific to metrology applications. The E2E learning model is trained using a diverse set of training images and corresponding ground truth measurement data. It evaluates various metrology benchmarks, including precision, correlation, and matching.

Conclusion

Tomer Haim Peled is an emerging inventor in the semiconductor industry, focusing on innovative measurement techniques that could significantly impact metrology applications. His work exemplifies the ongoing advancements in technology aimed at improving semiconductor analysis.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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