Company Filing History:
Years Active: 2013-2018
Title: The Innovative Contributions of Tom Lii
Introduction
Tom Lii is a prominent inventor based in Plano, TX (US), known for his significant contributions to the field of semiconductor technology. With a total of 12 patents to his name, Lii has made remarkable advancements that enhance the performance and efficiency of integrated circuits.
Latest Patents
Among his latest patents, Lii has developed a method for forming MOS transistors that includes a dielectric liner added after contact etch before silicide formation. This innovative approach involves providing a substrate with a semiconductor surface, a gate electrode, and dielectric spacers. The process also includes forming contact holes through a pre-metal dielectric layer and depositing a post-contact etch dielectric layer. This layer is selectively removed to leave a dielectric liner on the sidewalls of the PMD layer, ultimately allowing for the formation of a metal silicide layer on the contacts to the source and drain.
Another notable patent focuses on spacer shaper formation with a conformal dielectric film for void-free PMD gap fill. This integrated circuit formation process involves removing source/drain spacers from offset spacers on the sidewalls of MOS transistor gates and forming a contact etch stop layer spacer layer. The innovative techniques developed by Lii significantly improve the reliability and performance of semiconductor devices.
Career Highlights
Tom Lii is currently employed at Texas Instruments Corporation, where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in advancing the technology used in various electronic devices, making them more efficient and reliable.
Collaborations
Throughout his career, Lii has collaborated with notable colleagues, including David Gerald Farber and Steve Lytle. These partnerships have fostered a creative environment that has led to groundbreaking advancements in the field.
Conclusion
Tom Lii's contributions to semiconductor technology through his innovative patents and collaborations have made a significant impact on the industry. His work continues to inspire future advancements in integrated circuit design and manufacturing.