Grenoble, France

Tom Doekle Vethaak


 

Average Co-Inventor Count = 4.4

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: Tom Doekle Vethaak: Innovator in Superconducting Technologies

Introduction

Tom Doekle Vethaak is a notable inventor based in Grenoble, France. He has made significant contributions to the field of superconducting technologies, holding two patents that showcase his innovative approach to engineering and materials science.

Latest Patents

One of his latest patents is a method for producing a superconducting vanadium silicide on a silicon layer. This method involves treating a face of the silicon layer to prepare it for the deposition of vanadium silicide. Following this, a vanadium silicide layer is deposited on the prepared face, resulting in a stack that enhances the critical temperature of the deposited material. The treatment process includes the incorporation of argon atoms into the silicon layer. Another significant patent is for a Josephson transistor, which features a source and a drain, each comprising an electric charge reservoir in electrical contact with a semiconductor layer. This design includes reservoirs with lower and side faces that are integrated within the semiconductor layer, optimizing the transistor's performance.

Career Highlights

Tom has worked with esteemed institutions such as Université Grenoble Alpes and Commissariat à l'Énergie Atomique et aux Énergies Alternatives. His work at these organizations has allowed him to push the boundaries of superconducting materials and their applications.

Collaborations

Throughout his career, Tom has collaborated with notable colleagues, including Fabrice Nemouchi and François Lefloch. These partnerships have contributed to the advancement of his research and innovations.

Conclusion

Tom Doekle Vethaak stands out as a prominent inventor in the field of superconducting technologies. His patents reflect his commitment to advancing scientific knowledge and practical applications in this critical area of research.

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