Tohru Itoh

Title: Tohru Itoh: Innovator in Proximity Exposure Technology

Introduction

Tohru Itoh is a prominent inventor based in Tokyo, Japan. He is known for his significant contributions to the field of proximity exposure technology. His innovative approach has led to advancements in the way mask patterns are replicated in various applications.

Latest Patents

Tohru Itoh holds a patent for a "Proximity exposure method and machine therefor." This invention involves a method and apparatus for proximity exposure, where replications of mask patterns are executed. As a mask closely approaches a substrate, the displacement of the mask is detected. The atmospheric pressure between the mask and the substrate, or around the side of the mask opposite the substrate, is controlled to cancel the displacement of the mask. The apparatus includes positioning apparatus, a light source for exposing the mask pattern, displacement measuring means, and atmospheric pressure controlling means. He has 1 patent to his name.

Career Highlights

Tohru Itoh is associated with Sortec Corporation, where he has been instrumental in developing cutting-edge technologies. His work has significantly impacted the field of semiconductor manufacturing and exposure techniques.

Collaborations

Tohru has collaborated with notable colleagues, including Keisuke Koga and Nobufumi Atoda. Their combined expertise has contributed to the success of various projects within Sortec Corporation.

Conclusion

Tohru Itoh's innovative work in proximity exposure technology showcases his dedication to advancing the field. His contributions continue to influence the industry and inspire future innovations.