The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 1995
Filed:
Feb. 10, 1994
Applicant:
Inventors:
Assignee:
Sortec Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
355 76 ; 355 53 ;
Abstract
A proximity exposure method and apparatus therefor. Replications of mask patterns are carried out, wherein as a mask closely approaches a substrate, the displacement of the mask is detected, and the atmospheric pressure between the mask and the substrate, or around the side of the mask opposite the substrate is controlled so as to cancel the displacement of the mask. The apparatus includes positioning apparatus, a light source for exposing the mask pattern, displacement measuring means, and atmospheric pressure controlling means.