This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2013-2014.
Company Filing History:
Years Active: 2013-2014
Title: Todd Schroeder: Innovator in Silicon Film Deposition Technologies
Introduction
Todd Schroeder is a notable inventor based in Toledo, OH (US), recognized for his contributions to the field of silicon film deposition technologies. With a total of 3 patents, he has made significant advancements that enhance the efficiency and effectiveness of silicon-containing films.
Latest Patents
One of his latest patents is titled "Activated silicon precursors for low temperature deposition." This patent outlines processes for the low temperature deposition of silicon-containing films using activated SiH-containing precursors. The precursors may possess reactive functionalities such as halogen or cyano moieties. The patent describes processes in which halogenated or cyanated silanes are utilized to deposit SiN films, with plasma processing conditions that can be adjusted to modify the carbon, hydrogen, and/or nitrogen content of the films.
Another significant patent by Schroeder is "Carbosilane precursors for low temperature film deposition." This invention provides processes for the low temperature deposition of silicon-containing films using carbosilane precursors that contain a carbon atom bridging at least two silicon atoms. The methods involve providing a substrate and, in a PECVD process, exposing the substrate surface to a carbosilane precursor. The carbosilane precursor is then exposed to a low-powered energy source direct plasma to create a carbosilane at the substrate surface. The process includes densifying the carbosilane by stripping away some hydrogen atoms to yield a film comprising SiC, which may further be treated with a nitrogen source to produce a film comprising SiCN.
Career Highlights
Todd Schroeder is currently employed at Applied Materials, Inc., where he continues to innovate and develop new technologies in the field of silicon film deposition. His work has been instrumental in advancing the capabilities of silicon-based materials in various applications.
Collaborations
Throughout his career, Schroeder has collaborated with notable colleagues, including Timothy Weidman and David P. Thompson. These collaborations have contributed to the development of cutting-edge technologies and have fostered a productive research environment.
Conclusion
Todd Schroeder's contributions to the field of silicon film deposition technologies are significant and impactful. His innovative patents and ongoing work at Applied Materials, Inc. highlight his role as a leading inventor in this specialized area.