Tobias Gamon

Title: Innovations of Tobias Gamon

Introduction

Tobias Gamon is a notable inventor based in Warstein, Germany. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative approach to device production.

Latest Patents

One of his latest patents is a method and device for producing an edge structure of a semiconductor component. This method involves providing a semiconductor body with two spaced-apart main faces and etching a predetermined edge contour using a chemical etchant applied through an etchant jet. The etchant jet is directed tangentially to the edge face, allowing for precise control over the etching process. Another significant patent is a system and method for producing devices that include both a semiconductor part and a non-semiconductor part. This system features a front end for processing the semiconductor part and a back end for assembling it with the non-semiconductor part, utilizing a transfer device for automatic handling.

Career Highlights

Tobias has worked with prominent companies in the semiconductor industry, including Infineon Technologies AG and Infineon Technologies Bipolar GmbH & Co. KG. His experience in these organizations has contributed to his expertise in semiconductor device production.

Collaborations

Throughout his career, Tobias has collaborated with notable colleagues such as Oskar Neuhoff and Norbert Martin Haueis. These partnerships have likely enhanced his innovative capabilities and contributed to his successful patent applications.

Conclusion

Tobias Gamon is a distinguished inventor whose work in semiconductor technology has led to valuable patents and advancements in the field. His contributions continue to influence the development of innovative devices.