Company Filing History:
Years Active: 2021
Title: Innovations of Ting-Jui Lin in Electrostatic Discharge Protection
Introduction
Ting-Jui Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of electrostatic discharge (ESD) protection devices. His innovative work has implications for enhancing the reliability and performance of semiconductor devices.
Latest Patents
Ting-Jui Lin holds a patent for an "Electrostatic discharge protection device and layout design thereof." This patent describes an ESD protection device designed for semiconductor devices, which includes a gate, a source with a silicide portion featuring multiple source contacts, and a drain with a silicide portion containing several drain contacts. The design extends the source and drain away from the gate along a device axis. Additionally, the ESD device incorporates a resist protective oxide (RPO) portion situated on the semiconductor device, positioned between the drain and source contacts.
Career Highlights
Ting-Jui Lin is currently employed at Elite Semiconductor Memory Technology, Inc., where he continues to develop innovative solutions in semiconductor technology. His work focuses on improving the robustness of semiconductor devices against electrostatic discharge, which is crucial for their longevity and functionality.
Collaborations
Ting-Jui Lin collaborates with several talented individuals in his field, including Chien-Shao Tang and Hsiang-Ming J Chou. Their combined expertise contributes to the advancement of semiconductor technologies and the development of effective ESD protection solutions.
Conclusion
Ting-Jui Lin's contributions to the field of semiconductor technology, particularly through his patent on electrostatic discharge protection devices, highlight his role as an innovator in this critical area. His work not only enhances the reliability of semiconductor devices but also showcases the importance of collaboration in driving technological advancements.