This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignees: Asml Netherlands B.v., Carl Zeiss Smt Gmbh. Active years: 2026.
Company Filing History:
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1 out of 1,474 
Years Active: 2026
Title: The Innovative Mind of Timur Tudorovskiy
Introduction
Timur Tudorovskiy is a notable inventor based in Veldhoven, Netherlands. He has made significant contributions to the field of microlithography, particularly through his innovative patent. With a focus on enhancing projection exposure systems, Tudorovskiy has demonstrated a commitment to advancing technology in this specialized area.
Latest Patents
Timur Tudorovskiy holds a patent titled "Method of setting up a projection exposure system, a projection exposure method and a projection exposure system for microlithography." This patent describes a measuring system configured to assess a projection radiation property that represents an aberration level at multiple spaced measuring points within the image field. The invention includes an operating control system with a manipulator connected to an optical element of the projection exposure system. This setup allows for the modification of imaging properties based on measurement results from the measuring system. The measuring point distribution calculation is performed under specific boundary conditions, ensuring optimal performance for various use case scenarios.
Career Highlights
Throughout his career, Timur Tudorovskiy has worked with prominent companies in the industry. Notably, he has been associated with Carl Zeiss SMT GmbH and ASML Netherlands B.V. His experience in these organizations has contributed to his expertise in microlithography and projection exposure systems.
Collaborations
Timur has collaborated with several talented individuals in his field, including Toralf Gruner and Eva Schneider. These partnerships have likely enriched his work and fostered innovation in his projects.
Conclusion
Timur Tudorovskiy is a distinguished inventor whose work in microlithography has led to valuable advancements in projection exposure systems. His patent and career achievements reflect his dedication to innovation and technology.