Seefeld, Germany

Timo Stuffler

This inventor holds 4 USPTO granted patents and 1 EPO patent. Top assignees: Max-Planck-Gesellschaft Zur Förderung Der Wissenschaften E. V. , Other. Active years: 2003-2011.


% Patents Active = 50.0


Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 43(Granted Patents)


Location History:

  • Landsberied, DE (2003 - 2004)
  • Seefeld, DE (2003 - 2011)

Company Filing History:


Years Active: 2003-2011

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4 patents (USPTO):Explore Patents

Title: Timo Stuffler: Innovator in Plasma Technology

Introduction

Timo Stuffler is a notable inventor based in Seefeld, Germany. He has made significant contributions to the field of plasma technology, holding a total of 4 patents. His work focuses on methods and devices that enhance the operation and manipulation of plasma systems.

Latest Patents

Among his latest patents is a method and device for the operation of a plasma device. This invention describes a process where particles are arranged in a plasma, utilizing electric traveling waves to direct the movement of these particles to predetermined collection areas. Additionally, he has developed a device for specific particle manipulation and deposition. This process allows for the manipulation of particles in a plasma environment, ensuring that they do not form a plasmacrystalline state while being subjected to location-selective external forces.

Career Highlights

Throughout his career, Timo Stuffler has worked with esteemed organizations, including the Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. His innovative approaches have positioned him as a key figure in the advancement of plasma technology.

Collaborations

Timo has collaborated with notable colleagues such as Uwe Konopka and Gregor Eugen Morfill, contributing to various research projects and advancements in their field.

Conclusion

Timo Stuffler's work in plasma technology exemplifies the innovative spirit of modern inventors. His patents and collaborations continue to influence the development of advanced plasma systems.

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